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Determination of the coincidence lattice of an ultra thin Al2O3 film on Ni3Al(111)

  • S. Degen
  • , A. Krupski
  • , M. Kralj
  • , A. Langner
  • , C. Becker
  • , M. Sokolowski
  • , K. Wandelt

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Spot profile analysis low energy electron diffraction (SPA-LEED) and low temperature scanning tunneling microscopy (LT-STM) measurements were performed on an ultra thin alumina film grown at 1000 K in an oxygen atmosphere on Ni3Al(1 1 1). By the aid of these two experimental techniques it has been shown that the alumina film exhibits a large superstructure with a lattice constant of 4.16 nm. The unit cell of this superstructure has a commensurate (√67 × √67)R47.784° relation to the Ni3Al(1 1 1) substrate lattice.
    Original languageEnglish
    Pages (from-to)L57-L64
    JournalSurface Science
    Volume576
    Issue number1-3
    DOIs
    Publication statusPublished - 10 Feb 2005

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