Etching rate and structural modification of polymer films during low energy ion irradiation

V. Zaporojtchenko; J. Zekonyte; J. Erichsen; F. Faupel

doi:10.1016/S0168-583X(03)00625-6

Etching rate and structural modification of polymer films during low energy ion irradiation

V. Zaporojtchenko, J. Zekonyte, J. Erichsen, F. Faupel

Research output: Contribution to journal › Article › peer-review

Abstract

Various polymers were sputtered with low energy Ar⁺ions of 1 keV in order to determine their etching rate. Hydrocarbons, oxygenated, fluorinated and nitrogen-containing glassy polymers with a broad range of the glass transition temperature (T_g,) were chosen. The etching rate was measured using a profilometer, and X-ray photoelectron spectroscopy. At the same time the surface chemical modification, and the surface glass transition temperature were studied. Comparing the sputter rate to the various polymer properties a correlation among the Tg, cross-link density, and sputter rate was found. In addition, the sputter rate as a function of the integral ion fluence proved to exhibit a sharp increase in the initial regime of very low fluence. The results are discussed in terms of the characteristics of the polymers.

Original language	English
Pages (from-to)	155-160
Journal	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Volume	208
DOIs	https://doi.org/10.1016/S0168-583X(03)00625-6
Publication status	Published - Aug 2003

Keywords

ion irradiation effects
polymers
glass transition
X-ray photoelectron spectra - surface analysis

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10.1016/S0168-583X(03)00625-6

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title = "Etching rate and structural modification of polymer films during low energy ion irradiation",

abstract = "Various polymers were sputtered with low energy Ar+ ions of 1 keV in order to determine their etching rate. Hydrocarbons, oxygenated, fluorinated and nitrogen-containing glassy polymers with a broad range of the glass transition temperature (Tg,) were chosen. The etching rate was measured using a profilometer, and X-ray photoelectron spectroscopy. At the same time the surface chemical modification, and the surface glass transition temperature were studied. Comparing the sputter rate to the various polymer properties a correlation among the Tg, cross-link density, and sputter rate was found. In addition, the sputter rate as a function of the integral ion fluence proved to exhibit a sharp increase in the initial regime of very low fluence. The results are discussed in terms of the characteristics of the polymers.",

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author = "V. Zaporojtchenko and J. Zekonyte and J. Erichsen and F. Faupel",

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TY - JOUR

T1 - Etching rate and structural modification of polymer films during low energy ion irradiation

AU - Zaporojtchenko, V.

AU - Zekonyte, J.

AU - Erichsen, J.

AU - Faupel, F.

PY - 2003/8

Y1 - 2003/8

N2 - Various polymers were sputtered with low energy Ar+ ions of 1 keV in order to determine their etching rate. Hydrocarbons, oxygenated, fluorinated and nitrogen-containing glassy polymers with a broad range of the glass transition temperature (Tg,) were chosen. The etching rate was measured using a profilometer, and X-ray photoelectron spectroscopy. At the same time the surface chemical modification, and the surface glass transition temperature were studied. Comparing the sputter rate to the various polymer properties a correlation among the Tg, cross-link density, and sputter rate was found. In addition, the sputter rate as a function of the integral ion fluence proved to exhibit a sharp increase in the initial regime of very low fluence. The results are discussed in terms of the characteristics of the polymers.

AB - Various polymers were sputtered with low energy Ar+ ions of 1 keV in order to determine their etching rate. Hydrocarbons, oxygenated, fluorinated and nitrogen-containing glassy polymers with a broad range of the glass transition temperature (Tg,) were chosen. The etching rate was measured using a profilometer, and X-ray photoelectron spectroscopy. At the same time the surface chemical modification, and the surface glass transition temperature were studied. Comparing the sputter rate to the various polymer properties a correlation among the Tg, cross-link density, and sputter rate was found. In addition, the sputter rate as a function of the integral ion fluence proved to exhibit a sharp increase in the initial regime of very low fluence. The results are discussed in terms of the characteristics of the polymers.

KW - ion irradiation effects

KW - polymers

KW - glass transition

KW - X-ray photoelectron spectra - surface analysis

U2 - 10.1016/S0168-583X(03)00625-6

DO - 10.1016/S0168-583X(03)00625-6

M3 - Article

SN - 0168-583X

VL - 208

SP - 155

EP - 160

JO - Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

ER -

Etching rate and structural modification of polymer films during low energy ion irradiation

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