Fabrication of epitaxial Fe3O4 film on a Si(111) substrate

Nozomi Takahashi, Teodor Huminiuc, Yuta Yamamoto, Takashi Yanase, Toshihiro Shimada, Atsufumi Hirohata, Taro Nagahama*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The application of magnetic oxides in spintronics has recently attracted much attention. The epitaxial growth of magnetic oxide on Si could be the first step of new functional spintronics devices with semiconductors. However, epitaxial spinel ferrite films are generally grown on oxide substrates, not on semiconductors. To combine oxide spintronics and semiconductor technology, we fabricated Fe3O4 films through epitaxial growth on a Si(111) substrate by inserting a γ-Al2O3 buffer layer. Both of γ-Al2O3 and Fe3O4 layer grew epitaxially on Si and the films exhibited the magnetic and electronic properties as same as bulk. Furthermore, we also found the buffer layer dependence of crystal structure of Fe3O4 by X-ray diffraction and high-resolution transmission electron microscope. The Fe3O4 films on an amorphous-Al2O3 buffer layer grown at room temperature grew uniaxially in the (111) orientation and had a textured structure in the plane. When Fe3O4 was deposited on Si(111) directly, the poly-crystal Fe3O4 films were obtained due to SiOx on Si substrate. The epitaxial Fe3O4 layer on Si substrates enable us the integration of highly functional spintoronic devices with Si technology.

Original languageEnglish
Article number7009
Number of pages8
JournalScientific Reports
Volume7
Issue number1
DOIs
Publication statusPublished - 1 Aug 2017

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