Growth and characterisation of ferromagnetic and antiferromagnetic Fe2+xVyAl Heusler alloy films

Teodor Huminiuc, Oliver Whear, Tomoyuki Takahashi, Jun Young Kim, Andrew Vick, Gonzalo Vallejo-Fernandez, Kevin O'Grady, Atsufumi Hirohata*

*Corresponding author for this work

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Abstract

We investigated growth, annealing conditions and magnetic properties of the Heusler alloy Fe2+xVyAl by means of x-ray diffraction, magnetic hysteresis and exchange-bias measurements. Ferromagnetic Heusler alloy films were obtained by sputtering Fe2VAl and Fe3VAl targets and performing post-growth annealing. The characteristic (2 2 0) Heusler alloy peaks were seen in the x-ray diffraction measurements and corresponding ferromagnetic behaviours were observed. In addition, antiferromagnetic Heusler alloy films were deposited by employing Al pegs on Fe3VAl sputtering targets. The deposited films had elemental ratios close to the predicted Fe2.5V0.5Al phase, and a 16 Oe exchange-bias was measured in a Fe2.3V0.7Al/Co60Fe40 system at 100 K.

Original languageEnglish
Article number325003
Number of pages5
JournalJournal of Physics D: Applied Physics
Volume51
Issue number32
DOIs
Publication statusPublished - 13 Jul 2018

Keywords

  • antiferromagnet
  • exchange bias
  • Fe2VAl
  • Heusler alloys
  • spintronics
  • sputtering
  • x-ray diffraction
  • UKRI
  • EPSRC
  • EP/M02458X/1

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