Properties of ultrathin Pb layers on the Ni(111) face

The atomic structure and morphology of ultrathin Pb layers deposited on the Ni(111) face in ultrahigh vacuum at the substrate temperature ranging from 150 to 910 K were investigated with the use of Auger electron spectroscopy (AES), low-energy electron diffraction, and directional elastic peak electron spectroscopy (DEPES). The analysis of AES measurements indicates that the two-dimensional growth of the first Pb monolayer takes place for the substrate temperature 180 K<T<480 K. For 180 K<T<270 K, flat two- and three-atomic layer islands (“wedding cakes”) seem to grow after the completion of the first lead monolayer. Then, the three-dimensional growth starts. DEPES measurements indicate that for layers deposited at T=150 K a twin interface abcBACBAC is formed between the Ni substrate and the Pb layer.