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Pattern formation on silicon by means of laser-initiated liquid-assisted colloidal (LILAC) lithography

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We report sub-diffraction limited patterning of Si substrate surfaces by laser-initiated liquid-assisted colloidal lithography. The technique involves exposing a two-dimensional lattice of transparent colloidal particles spin coated on the substrate of interest (here Si) immersed in a liquid (e.g. methanol, acetone, carbon tetrachloride, toluene) to a single picosecond pulse of ultraviolet laser radiation. Surface patterns formed using colloidal particles with different radii in the range 195 nm ≤ R ≤ 1.5 μm and liquids with differing indices of refraction (nliquid) are demonstrated, the detailed topographies of which are sensitively dependent upon whether the index of refraction of the colloidal particle (ncolloid) is greater or smaller than nliquid (i.e. upon whether the incident light converges or diverges upon interaction with the particle). The spatial intensity modulation formed by diffraction of the single laser pulse by the colloidal particles is imprinted into the Si substrate.
Original languageEnglish
Article number455303
JournalNanotechnology
Volume26
DOIs
Publication statusPublished - 21 Oct 2015

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  • Pattern formation on silicon by laser initiated liquid-assisted colloidal lithography

    Rights statement: This is an author-created, un-copyedited version of an article accepted for publication/published in Nanotechnology. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.1088/0957-4484/26/45/455303.

    Accepted author manuscript (Post-print), 995 KB, PDF document

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